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Advances in CMP Polishing Technologies
Language: en
Pages: 330
Authors: Toshiro Doi
Categories: Science
Type: BOOK - Published: 2011-12-06 - Publisher: William Andrew

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CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing
Advances in Chemical Mechanical Planarization (CMP)
Language: en
Pages: 650
Authors: Babu Suryadevara
Categories: Technology & Engineering
Type: BOOK - Published: 2021-09-10 - Publisher: Woodhead Publishing

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Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, hi
Chemical-Mechanical Planarization of Semiconductor Materials
Language: en
Pages: 444
Authors: M.R. Oliver
Categories: Technology & Engineering
Type: BOOK - Published: 2004-01-26 - Publisher: Springer Science & Business Media

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This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor te
Chemical Mechanical Planarization of Microelectronic Materials
Language: en
Pages: 337
Authors: Joseph M. Steigerwald
Categories: Science
Type: BOOK - Published: 2008-09-26 - Publisher: John Wiley & Sons

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Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its univ
Semiconductor Manufacturing Handbook
Language: en
Pages: 915
Authors: Hwaiyu Geng
Categories: Technology & Engineering
Type: BOOK - Published: 2005-05-18 - Publisher: McGraw Hill Professional

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WORLD-CLASS SEMICONDUCTOR MANUFACTURING EXPERTISE AT YOUR FINGERTIPS This is a comprehensive reference to the semiconductor manufacturing process and ancillary