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Fundamental Electron Interactions with Plasma Processing Gases
Language: en
Pages: 791
Authors: Loucas G. Christophorou
Categories: Science
Type: BOOK - Published: 2012-12-06 - Publisher: Springer Science & Business Media

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This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and
Electron Interactions with Plasma Processing Gases
Language: en
Pages:
Authors:
Categories:
Type: BOOK - Published: - Publisher:

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Presents electron-collision cross section data and transport coefficients for gases used in the manufacturing of semiconductor devices from the Electronics and
Plasma Processing of Materials
Language: en
Pages: 88
Authors: National Research Council
Categories: Technology & Engineering
Type: BOOK - Published: 1991-02-01 - Publisher: National Academies Press

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Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive,
Assessed Total and Partial Ionization Cross Sections for CF4, C2F6, C3F8, CHF3, CF3I, C-C4F8, Cl2, CCl2F2, BCl3, SF6, and Fragments of CF4 and SF6
Language: en
Pages: 8
Authors: Loucas G. Christophorou
Categories:
Type: BOOK - Published: 2004 - Publisher:

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The authors recently completed an updated review, synthesis, assessment, and discussion of low-energy electron interactions with the plasma processing gases CF4
Handbook of Advanced Plasma Processing Techniques
Language: en
Pages: 664
Authors: R.J. Shul
Categories: Technology & Engineering
Type: BOOK - Published: 2011-06-28 - Publisher: Springer Science & Business Media

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.