The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical p

Illustrating their intersecting role in manufacturing and technological development, this book examines tribological principles and their applications in CMP, i

This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor te

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, hi

Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its univ