Chemical Vapor Deposition for Microelectronics
| Author | : Arthur Sherman |
| Publisher | : William Andrew |
| Total Pages | : 240 |
| Release | : 1987 |
| ISBN-10 | : UOM:39015012752427 |
| ISBN-13 | : |
| Rating | : 4/5 (27 Downloads) |
Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
