Etude de la fiabilité des transistors RF LDMOS de puissance en mode pulsé pour des applications hyperfréquences

Etude de la fiabilité des transistors RF LDMOS de puissance en mode pulsé pour des applications hyperfréquences
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Total Pages : 230
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ISBN-10 : OCLC:494645588
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Book Synopsis Etude de la fiabilité des transistors RF LDMOS de puissance en mode pulsé pour des applications hyperfréquences by : Mohamed Gares

Download or read book Etude de la fiabilité des transistors RF LDMOS de puissance en mode pulsé pour des applications hyperfréquences written by Mohamed Gares and published by . This book was released on 2008 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since their early implementation, the length of pulses and the cyclic report/ratio did not cease increasing in order to increase the radar performances. These strong requirements of operation increased the quantity of pressure applied to the transistors, which constitue the modules of power in the radars and have a direct impact over their life times. A thorough knowledge of this impact is necesary for a better estimation of the reliability of modules and transistors, which make it up. It is for all these reasons that a study was committed to work out new investigation methods of the power RF components under RF pulses conditions for a radar application. A transistor RF LDMOS was retained for our first tests in accelerated ageing under various conditions (DC, RF, temperature and TOS). Electric characterizations (I-V, C-V and [S] parameters) were carried out. Thus, a complete examination of these critical electric parameters is exposed and analysed. All electric parameter drift after an accelerated ageing are studied and discussed. According to the analysis of these results, one notes that the lower the temperature is, the more important the drifts int the significant electric parameters. In order to understand the physical degradation phenomena inside the structure, we performed a 2-D physical simulation (Silvaco-Atlas). Finally, the degradation mechanism proposed for RF LDMOS is the interface states creation by the hot carriers (traps).


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