The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma ph

This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniat

Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each