Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP)

Author	: Shantanu Tripathi
Publisher	:
Total Pages	: 404
Release	: 2008
ISBN-10	: UCAL:C3489790
ISBN-13	:
Rating	: 4/5 (90 Downloads)

DOWNLOAD EBOOK

Book Synopsis Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP) by : Shantanu Tripathi

Download or read book Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP) written by Shantanu Tripathi and published by . This book was released on 2008 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP) Related Books

Language: en
Pages: 404

Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP)

Authors: Shantanu Tripathi

Categories:

Type: BOOK - Published: 2008 - Publisher:

DOWNLOAD EBOOK

Language: en
Pages: 650

Advances in Chemical Mechanical Planarization (CMP)

Authors: Babu Suryadevara

Categories: Technology & Engineering

Type: BOOK - Published: 2021-09-10 - Publisher: Woodhead Publishing

DOWNLOAD EBOOK

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, hi

Language: en
Pages: 110

Tribocorrosion

Authors: Anna Igual Munoz

Categories: Technology & Engineering

Type: BOOK - Published: 2020-06-16 - Publisher: Springer Nature

DOWNLOAD EBOOK

This book is a toolbox for identifying and addressing tribocorrosion situations from an engineering point of view. It is an accessible and introductory guidelin

Language: en
Pages: 148

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect

Authors: Jie Cheng

Categories: Technology & Engineering

Type: BOOK - Published: 2017-09-06 - Publisher: Springer

DOWNLOAD EBOOK

This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barr

Language: en
Pages: 376

Chemical-Mechanical Planarization: Volume 767

Authors: Duane S. Boning

Categories: Technology & Engineering

Type: BOOK - Published: 2003-08-27 - Publisher:

DOWNLOAD EBOOK

Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have